Equipment Details



Name of the EquipmentMolecular Beam Epitaxy III-V
Categorysemi clean b
OperatorDebi Prasad Panda
System OwnerDebi Prasad Panda
154076011@iitb.ac.in

Short NameMBE III-V GaAs
MakeRiber France
ModelEPINEAT
Serial NumberNA
FootPrintNA
InstallationDate05/09/2011
Equipment TypeDeposition, Growth and Annealing systems
LocationMBE Clean Room 1 (NanoE bldg, Gr floor)
AMC Required
Local DealerNA

NA
Actual DealerRiber France

NA
SOP SOP/120_SOP.pdf
Training & other policy documents
Recipies
Glimpse GLIMPSE/120_Glimpse.pdf
Tool Facilities RequirementsNA
AccessControlled
Lab Phone No4488 Ext Flash 105
Substrate allowedGaAs
Substrate Dimension2 inch minimum, 4 inch maximum
Chemical allowedIPA, Methanol, GaAs
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedPN2, He
Contamination remarksNA