Equipment Details



Name of the EquipmentRaithEBL_Long
Categorylitho/analytical
OperatorShalini Shrivastava
System OwnerShalini Shrivastava
shalini@ee.iitb.ac.in

Kartikey Thakar
154076022@iitb.ac.in

Short NameRaith
MakeRaith GmbH
Model150-Two
Serial NumberSupra 35-29-89
FootPrint187 cm* 78cm * 90cm
InstallationDate07/27/2008
Equipment TypeLithography tools
LocationNano Litho Lab
AMC Required
Local DealerRaith India

Dr.S.V.Pandurangaiah Vice President- Customer Support, SIMCO Global Technology & Systems Ltd 305 MBC, 134 Infantry Road, Bangalore-560001 Cell:0091- 9945004355 Phone:0091-80-22862301 Fax:0091-80-22862301 e-mail:pandurangaiah.sv@simcogroup.in office e-mail:simco.bng@simcogroup.in website: www.simco-groups.com
Actual DealerRaith GmbH

Mr. Andreas / Mr. Bernd, Raith GmbH Bernd Stegemann Technical Support Manager - Field Service email:stegemann@raith.de phone: +49 (231) 95004 230 - mobil: +49 (151) 46737102 fax: +49 (231) 95004 460 web: http://www.raith.com Raith Service & Support Team -- mailto:support@raith.de -- phone: +49 (0) 231 95004 - 499
SOP SOP/315_SOP.pdf
Training & other policy documentsPOLICY/315_POLICY.pdf
Recipies RECEPIES/315_RECEPIES.pdf
Glimpse GLIMPSE/315_GLIMPSE.pdf
Tool Facilities RequirementsWater chiller, compressor, nitrogen, ups, dehumidifier
AccessOpen
Lab Phone No4411
Substrate allowedSi, III-V, Glass, Sapphire, Quartz, fused silica
Substrate DimensionMin- 1cmx1cm, Max- 4 inch - 8 inch wafer
Chemical allowedIPA, All Materials allowed. Powdered material avoided Powdered materials considered only on case by case basis
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedN2
Contamination remarksGeneral purpose holder to be used for all INUP and out of the Dept Samples. Na, K, Cu is allowed on general purpose holder only.