Equipment Details



Name of the EquipmentHot wire CVD(HWCVD)
Categorygold contaminated
OperatorBhimraj Sable
System OwnerAnjum Ahmed
anjum04@iitb.ac.in

Short NameHWCVD
MakeIndigenious Assembled System
ModelNA
Serial NumberNA
FootPrint13 x 11 ft
InstallationDate2006
Equipment TypeDeposition, Growth and Annealing systems
LocationMicro2 Lab
AMC Required
Local DealerExcel Instruments, Andheri

Subhash Pai Ph: 022 65008911 Jeetlal: 9004611185
Actual DealerSubhash Pai

Ph: 022 65008911
SOP SOP/5_SOP.pdf
Training & other policy documentsPOLICY/5_Policy.pdf
Recipies RECEPIES/5_RECEPIES.pdf
Glimpse GLIMPSE/5_Glimpse.pdf
Tool Facilities RequirementsChilled water, GN2, PN2, Silane, Ammonia, Diborane, Hydrogen gases
AccessOpen
Lab Phone No4464
Substrate allowedSi, Glass, Quartz
Substrate DimensionMin- 1cmx1cm, Max- 2 inch wafer
Chemical allowedMethanol for cleaning, SiNx, SiO2, Materials allowed at low substrate temp- SU8, Au, Al, Cu
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedSiH4, NH3, N2, H2, B2H6
Contamination remarks