Equipment Details



Name of the EquipmentRapid Thermal Processing(RTP)
Categorygold contaminated
OperatorPijush Chakraborty
Hitesh Kamble
System OwnerPankaj Upadhyay
pupadhyay@iitb.ac.in

Hitesh Kamble
hit.kamble@ee.iitb.ac.in

Short NameRTP Annealsys
MakeAnnealSys- AS-ONE 150
ModelAS-ONE 150
Serial NumberNA
FootPrint2 Meters by 1meter
InstallationDate02/01/2008
Equipment TypeDeposition, Growth and Annealing systems
LocationNano Lab
AMC Required
Local DealerEl Camino Technologies Pvt. Ltd.

El Camino Technologies Pvt. Ltd. #8, 1st block, 1st main, BEL Layout, Vidyaranyapura, Bangalore - 560097, INDIA. Tel: 91 80 23640503 Contact Person: Amaresh.N.G, Maintenance Engineer, MOB NO - 09900836368 e-mail: maintenance@elcamino.in, Contact Person: 1) Chetna Mohan: chetnamohan@elcamino.in 2) Amaresh N G: maintenance@elcamino.in (+919900836368)
Actual DealerAnnealSys

Annealsys Bat T2, PIT de la Pompignane, Rue de la Vieille Poste, 34055 Montpellier Cedex 1, France Phone: +33 467 20 23 63 Email: info@annealsys.com Contact Person(s): 1) Frank Laporte: flaporte@annealsys.com, 2) 2) Albin Diranzo: adiranzo@annealsys.com
SOP SOP/7_SOP.pdf
Training & other policy documentsPOLICY/7_POLICY.pdf
Recipies
Glimpse GLIMPSE/7_Glimpse.pdf
Tool Facilities RequirementsChiller water, PN2, GN2, O2, Ar, FGA
AccessOpen
Lab Phone No4411
Substrate allowedSilicon, GaAs, GaN, Sapphire, Germanium
Substrate DimensionFor Si: approx. 1/4 of 2 inch to12 inch. For GaAs/ GaN/ Sapp hire/ Germanium: 0.5cm x 0.5cm to aroun
Chemical allowedNA, NA
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedNitrogen, Oxygen, Argon, FGA
Contamination remarksGold contaminated, Outside samples, NCPRE Samples, OE Lab, Na+ & K+ not allowed further information contact SO/Process InCharge