Equipment Details



Name of the EquipmentPlasma Immersion Ion Implantation (PIII)
Categorysemi clean b
OperatorPoonam Katkar
Anjum Ahmed
System OwnerJayeeta Biswas (Sen)
p13046@iitb.ac.in

Anjum Ahmed
anjum04@iitb.ac.in

Short NamePIII
MakeIndigenious Assembled System
ModelNA
Serial NumberNA
FootPrint9 x 9.5 feet
InstallationDate2009
Equipment TypeMiscellaneous
LocationMicro2 Lab
AMC Required
Local DealerExcel Instruments

Excel Instruments, Andheri Subhash Pai Ph: 022 65008911 Jeetlal: 9004611185
Actual DealerIndigenious Assembled System

Subhash Pai Ph: 022 65008911
SOP SOP/73_SOP.pdf
Training & other policy documentsPOLICY/73_POLICY.pdf
Recipies RECEPIES/73_RECEPIES.pdf
Glimpse GLIMPSE/73_Glimpse.pdf
Tool Facilities RequirementsChilled water, GN2, PN2, Diborane, Phosphine gases
AccessOpen
Lab Phone No4464
Substrate allowedSi, Ge
Substrate DimensionMax 4 inch wafer
Chemical allowedPPR, PMMA, SiO2, SiNx, a-Si, Si, SiGe, Ge, Ni, Co, Pt, Al, Hf, Ta, Mo, W, Ti, Cr, Zr, Pd
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedB2H6, PH3
Contamination remarksSamples from gold contaminated tools are not allowed