Equipment Details



Name of the EquipmentInductively coupled plasma CVD (ICPCVD)
Categorysemi clean b
OperatorVivek Surana
Pijush Chakraborty
Navneet Bhardwaj
System OwnerHitesh Kamble
hit.kamble@ee.iitb.ac.in

Short NameICPCVD
MakeOxford Instruments
ModelPlasma lab system100
Serial Number94-814852
FootPrintLength 1.93 mtr, Breadth 2.28 mtr, Height1.57
InstallationDate08/01/2008
Equipment TypeDeposition, Growth and Annealing systems
LocationNano Lab
AMC Required
Local DealerGurpal Singh

Gurpal.SINGH@oxinst.com
Actual DealerOxford instruments

thomas.miller@oxinst.com
SOP SOP/8_SOP.pdf
Training & other policy documentsPOLICY/8_POLICY.pdf
Recipies RECEPIES/8_RECEPIES.pdf
Glimpse GLIMPSE/8_Glimpse.pdf
Tool Facilities RequirementsNitrogen, Argon, Silane, CF4, N2O, Ammonia, Hydrogen, Water connection
AccessOpen
Lab Phone No4411
Substrate allowedSi/ Ge/ GaN/ Quartz/ GaA s
Substrate DimensionPieces to 4 inch wafer
Chemical allowedIPA for cleaniing, Si, TiN, ZnO, GaN, GaAs, Al
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedGN2, PN2, Ar, N2O, SiH4, NH3, H2, He, CF4/ O2 for cleaning
Contamination remarksGold contaminated wafers not allowed.Outside samples, NCPRE Samples, OE Lab, Na+ & K+ not allowed further information contact SO/Process InCharge