Equipment Details


AMAT - Etch Chamber (Ch-A)

Name of the EquipmentAMAT - Etch Chamber (Ch-A)
Categorysemi clean b
OperatorSandeep Mane
System OwnerSandeep Mane
manesandeep83@iitb.ac.in

Short Name
Make/ ModelAMAT/ NA
Critical ToolNo
Serial NumberS007009
FootPrint2 mtr X 1.73 mtr
InstallationDate06/01/2006
Equipment TypeDry Etch tools
LocationAMAT Lab
AMC Required
Local DealerNA

NA
Actual DealerAMAT

AMAT exploration center IITB Bombay.
SOP SOP/101_SOP.pdf
Training & other policy documents
Recipies RECEPIES/101_RECEPIES.pdf
Glimpse GLIMPSE/101_GLIMPSE.pdf
Tool Facilities RequirementsAHU, Chiller, Heat exchanger, Pump, N2 plant, Exhaust, Scrubber.
AccessOpen
Lab Phone No4402
Substrate allowedSi/ Ge
Substrate DimensionMax 8 inch wafers
Chemical allowedIPA while chamber cleaning., Polysilicon, Al, TiN, Al2O3, Si, SiO2, HfO2, TaO2
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionMin 15 x 15 mm to max 200 mm
Gases allowedO2 , N2, SF6 , BCl3 , Cl2 , HF3, He
Contamination remarksNA
Last updated on: 20-Jan-2023