AMAT - Etch Chamber (Ch-A)
| Name of the Equipment | AMAT - Etch Chamber (Ch-A) |
| Category | semi clean b |
| Operator | Sandeep Mane |
| System Owner | Sandeep Mane manesandeep83@iitb.ac.in |
| Short Name | |
| Make/ Model | AMAT/ NA |
| Critical Tool | No |
| Serial Number | S007009 |
| FootPrint | 2 mtr X 1.73 mtr |
| InstallationDate | 06/01/2006 |
| Equipment Type | Dry Etch tools |
| Location | AMAT Lab |
| AMC | Required |
| Local Dealer | NA NA |
| Actual Dealer | AMAT AMAT exploration center IITB Bombay. |
| SOP | SOP/101_SOP.pdf |
| Training & other policy documents | |
| Recipies | RECEPIES/101_RECEPIES.pdf |
| Glimpse | GLIMPSE/101_GLIMPSE.pdf |
| Tool Facilities Requirements | AHU, Chiller, Heat exchanger, Pump, N2 plant, Exhaust, Scrubber. |
| Access | Open |
| Lab Phone No | 4402 |
| Substrate allowed | Si/ Ge |
| Substrate Dimension | Max 8 inch wafers |
| Chemical allowed | IPA while chamber cleaning., Polysilicon, Al, TiN, Al2O3, Si, SiO2, HfO2, TaO2 |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | Min 15 x 15 mm to max 200 mm |
| Gases allowed | O2 , N2, SF6 , BCl3 , Cl2 , HF3, He |
| Contamination remarks | NA |