Equipment Details


AMAT - FEP Centura - DPN Chamber (Ch-A)

Name of the EquipmentAMAT - FEP Centura - DPN Chamber (Ch-A)
Categoryclean
Operator
System Owner
Short Name
Make/ ModelApplied Materials/ FEP Centura/ Gate S
Critical ToolNo
Serial NumberNA
FootPrint2 mtr X 2.245
InstallationDate06/01/2006
Equipment TypeDeposition, Growth and Annealing systems
LocationAMAT Lab
AMC Required
Local DealerAMAT

AMAT exploration center IIT Bombay.
Actual DealerAMAT

AMAT exploration center IIT Bombay.
SOP SOP/102_SOP.pdf
Training & other policy documents
Recipies RECEPIES/102_RECEPIES.pdf
Glimpse
Tool Facilities RequirementsChiller, AHU, Pump, Scrubber, gas
AccessOpen
Lab Phone No4402
Substrate allowedSi/ Glass/ Ge
Substrate DimensionMax 8 inch wafers
Chemical allowedIPA only for chamber cleaning., SiO2, Al, Ti, HfO
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimension1cm X 1 cm to 8 inch.
Gases allowedN2, O2, He
Contamination remarksNA
Last updated on: 20-Jan-2023