AMAT - FEP Centura - RTP Chamber (Ch-C)
| Name of the Equipment | AMAT - FEP Centura - RTP Chamber (Ch-C) |
| Category | clean |
| Operator | |
| System Owner | |
| Short Name | |
| Make/ Model | Applied Materials/ FEP Centura/ Gate S |
| Critical Tool | No |
| Serial Number | NA |
| FootPrint | 2 mtr X 2.245 mtr |
| InstallationDate | 08/01/2007 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | AMAT Lab |
| AMC | Required |
| Local Dealer | NA NA |
| Actual Dealer | Applied Materials, USA NA |
| SOP | SOP/104_SOP.pdf |
| Training & other policy documents | |
| Recipies | |
| Glimpse | |
| Tool Facilities Requirements | N2, O2, He, Ar, Chiller |
| Access | Open |
| Lab Phone No | 4402 |
| Substrate allowed | Si/ Glass/ Ge |
| Substrate Dimension | 1cm X 1cm, 2 inch, 4 inch, 8 inch |
| Chemical allowed | NA, SiO2, Al2O3, HfO |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | N2, O2, He, Ar, H2, NH3 |
| Contamination remarks | NA |