Equipment Details


AMAT - FEP Centura - RTP Chamber (Ch-C)

Name of the EquipmentAMAT - FEP Centura - RTP Chamber (Ch-C)
Categoryclean
Operator
System Owner
Short Name
Make/ ModelApplied Materials/ FEP Centura/ Gate S
Critical ToolNo
Serial NumberNA
FootPrint2 mtr X 2.245 mtr
InstallationDate08/01/2007
Equipment TypeDeposition, Growth and Annealing systems
LocationAMAT Lab
AMC Required
Local DealerNA

NA
Actual DealerApplied Materials, USA

NA
SOP SOP/104_SOP.pdf
Training & other policy documents
Recipies
Glimpse
Tool Facilities RequirementsN2, O2, He, Ar, Chiller
AccessOpen
Lab Phone No4402
Substrate allowedSi/ Glass/ Ge
Substrate Dimension1cm X 1cm, 2 inch, 4 inch, 8 inch
Chemical allowedNA, SiO2, Al2O3, HfO
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedN2, O2, He, Ar, H2, NH3
Contamination remarksNA
Last updated on: 20-Jan-2023