AMAT - PVD - Al2O3 (Ch-1)
| Name of the Equipment | AMAT - PVD - Al2O3 (Ch-1) |
| Category | semi clean a |
| Operator | |
| System Owner | |
| Short Name | |
| Make/ Model | Applied Material/ Endura |
| Critical Tool | No |
| Serial Number | 20749 |
| FootPrint | 2.55 mtr X 2.30 mtr |
| InstallationDate | 06/01/2007 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | AMAT Lab |
| AMC | Required |
| Local Dealer | Applied Material 07738096827 |
| Actual Dealer | Applide Material Inc. 07738096827 |
| SOP | SOP/106_SOP.pdf |
| Training & other policy documents | |
| Recipies | RECEPIES/106_RECEPIES.pdf |
| Glimpse | GLIMPSE/106_GLIMPSE.pdf |
| Tool Facilities Requirements | Chiller, Non toxic gas, N2 plant, Heat exchanger, Pump etc. |
| Access | Open |
| Lab Phone No | 4402 |
| Substrate allowed | Si/ Glass/ Ge |
| Substrate Dimension | Max 8 inch wafers |
| Chemical allowed | For cleaning of the system IPA is used, SiO2 |
| Precursors/ Targets allowed *Based on stock availability | Al |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | Ar, O2 |
| Contamination remarks | N2 Gas |