Equipment Details


AMAT - PVD - Al2O3 (Ch-1)

Name of the EquipmentAMAT - PVD - Al2O3 (Ch-1)
Categorysemi clean a
Operator
System Owner
Short Name
Make/ ModelApplied Material/ Endura
Critical ToolNo
Serial Number20749
FootPrint2.55 mtr X 2.30 mtr
InstallationDate06/01/2007
Equipment TypeDeposition, Growth and Annealing systems
LocationAMAT Lab
AMC Required
Local DealerApplied Material

07738096827
Actual DealerApplide Material Inc.

07738096827
SOP SOP/106_SOP.pdf
Training & other policy documents
Recipies RECEPIES/106_RECEPIES.pdf
Glimpse GLIMPSE/106_GLIMPSE.pdf
Tool Facilities RequirementsChiller, Non toxic gas, N2 plant, Heat exchanger, Pump etc.
AccessOpen
Lab Phone No4402
Substrate allowedSi/ Glass/ Ge
Substrate DimensionMax 8 inch wafers
Chemical allowedFor cleaning of the system IPA is used, SiO2
Precursors/ Targets allowed
*Based on stock availability
Al
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedAr, O2
Contamination remarksN2 Gas
Last updated on: 20-Jan-2023