Equipment Details


2 inch RCA Clean Station

Name of the Equipment2 inch RCA Clean Station
Categoryclean (for si)
OperatorShilpa Kharat
Nikhil (NH) Palkar
Hemlata Tiwari (NH)
System OwnerMinita Surwade (NH)
minita@iitb.ac.in

Pankajkumar Gound
p15129@iitb.ac.in

Short Name
Make/ ModelM/S Laxmi Instruments/ NA
Critical ToolYes
Serial Number200801132 (P O numbe
FootPrint465cm X 287cm
InstallationDate03/25/2009
Equipment TypeWet chemistry tools
LocationWet Chemistry lab
AMC Not Required
Local DealerRupesh Khule

07208246450(for DI water system)
Actual DealerNA

NA
SOP SOP/132_SOP.pdf
Training & other policy documentsPOLICY/132_Policy.pdf
Recipies RECEPIES/132_RECEPIES.pdf
Glimpse GLIMPSE/132_Glimpse.pdf
Tool Facilities RequirementsDI Water, Chemicals, Heater
AccessOpen
Lab Phone No4464
Substrate allowedSilicon wafers only
Substrate Dimension1/4 of 2 inch minimum. 2 inch maximum
Chemical allowedAmmonium Hydroxide, H2O2, HCl, HF, DI water, Only Si wafers, and Quartz glass
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedNA
Contamination remarksNo other chemicals allowed. No glasswares allowed. Only teflon and quartz is allowed. Sodium and potassium contamination strictly prohibited.
Last updated on: 20-Jul-2022