2 inch RCA Clean Station
| Name of the Equipment | 2 inch RCA Clean Station |
| Category | clean (for si) |
| Operator | Shilpa Kharat Shahiroze Khetani |
| System Owner | Minita Surwade (NH) minita@iitb.ac.in Pankajkumar Gound p15129@iitb.ac.in |
| Short Name | |
| Make/ Model | M/S Laxmi Instruments/ NA |
| Critical Tool | |
| Serial Number | 200801132 (P O numbe |
| FootPrint | 465cm X 287cm |
| InstallationDate | 03/25/2009 |
| Equipment Type | Wet chemistry tools |
| Location | Wet Chemistry lab |
| AMC | Not Required |
| Local Dealer | Rupesh Khule 07208246450(for DI water system) |
| Actual Dealer | NA NA |
| SOP | SOP/132_SOP.pdf |
| Training & other policy documents | POLICY/132_Policy.pdf |
| Recipies | RECEPIES/132_RECEPIES.pdf |
| Glimpse | GLIMPSE/132_Glimpse.pdf |
| Tool Facilities Requirements | DI Water, Chemicals, Heater |
| Access | Open |
| Lab Phone No | 4464 |
| Substrate allowed | Silicon wafers only |
| Substrate Dimension | 1/4 of 2 inch minimum. 2 inch maximum |
| Chemical allowed | Ammonium Hydroxide, H2O2, HCl, HF, DI water, Only Si wafers, and Quartz glass |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | NA |
| Contamination remarks | No other chemicals allowed. No glasswares allowed. Only teflon and quartz is allowed. Sodium and potassium contamination strictly prohibited. |