Spinner 8 inch (General Purpose)
| Name of the Equipment | Spinner 8 inch (General Purpose) |
| Category | litho/analytical |
| Operator | Akshata(NH) Bhosle Hemant Kshirsagar |
| System Owner | Hemant Kshirsagar hemant@ee.iitb.ac.in Akshata(NH) Bhosle akshata@iitb.ac.in |
| Short Name | |
| Make/ Model | Laurell Technologies/ WS-400B-8NPP/LITE |
| Critical Tool | Yes |
| Serial Number | 07403 |
| FootPrint | 55' inch(L) x �70 inch (W) X 50 inch(H) |
| InstallationDate | |
| Equipment Type | Lithography tools |
| Location | Nano Litho Lab |
| AMC | Required |
| Local Dealer | M/s Simco Global Technology & Systems Ltd. M/s Simco Global Technology & Systems Ltd. 304, Thacker Tower, Sector-17, Vashi, Nawi Mumbai � 400 705 Tel: 022-27801176 Email: simcoltdmumbai@vsnl.com Hirlekar- 9820106336 |
| Actual Dealer | M/s Laurell Technologies Corporation M/s Laurell Technologies Corporation 441, Industrial Drive, North Wales, PA 19454-2537 USA Phone: 215-699-7278 Email: sales@laurell.com Hirlekar- 9820106336 |
| SOP | SOP/142_SOP.pdf |
| Training & other policy documents | |
| Recipies | |
| Glimpse | GLIMPSE/142_GLIMPSE.pdf |
| Tool Facilities Requirements | Vacuum Pump, Work benches, exhaust, hot plates, N2 blower |
| Access | Open |
| Lab Phone No | 4411 |
| Substrate allowed | Si, Glass, GaAs |
| Substrate Dimension | max - 8 inch; min - 10cmx10cm |
| Chemical allowed | ALL PHOTORESIST, positive and negative photoresist as well as EBL resist, HMDS |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | N2 |
| Contamination remarks | Outside samples, NCPRE Samples, OE Lab, Na+ & K+ not allowed further information contact SO/Process InCharge |