Ultech Furnace Silicon Oxynitride (SiON)
| Name of the Equipment | Ultech Furnace Silicon Oxynitride (SiON) |
| Category | clean |
| Operator | Bhimraj Sable |
| System Owner | Pradeep Nyaupane pradeeprn@iitb.ac.in |
| Short Name | |
| Make/ Model | Ultech/ NA |
| Critical Tool | No |
| Serial Number | NA |
| FootPrint | Lenght 5.02 mtr, Breadth 2.15 mtr, Height 2.00 mt |
| InstallationDate | 2008 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Nano Lab |
| AMC | Required |
| Local Dealer | ETS, Bangalore Mr. Ramesh 09845000788 |
| Actual Dealer | Ultech 8-2, Horim-dong, Dalseo-gu, Dargu, Korea, 704240 Technical Division/ Assistant Manager : Mr. Kyeong-Sin-Kim TEL : 82-53-583-7565 FAX : 82-53-583-6872 H.P : 82-10-4264-3215 E-mail : kskim@ultech.co.kr |
| SOP | SOP/147_SOP.pdf |
| Training & other policy documents | POLICY/147_POLICY.pdf |
| Recipies | |
| Glimpse | GLIMPSE/147_Glimpse.pdf |
| Tool Facilities Requirements | N2O, Oxygen, Nitrogen |
| Access | Open |
| Lab Phone No | 4411 |
| Substrate allowed | Si Wafer |
| Substrate Dimension | 4 inch |
| Chemical allowed | NA, Only 4 inch RCA Cleaned Si wafers |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | N2O, Oxygen, Nitrogen |
| Contamination remarks | RCA cleaned wafers only allowed |