Equipment Details


Ultech Furnace Silicon Oxynitride (SiON)

Name of the EquipmentUltech Furnace Silicon Oxynitride (SiON)
Categoryclean
OperatorBhimraj Sable
System OwnerPradeep Nyaupane
pradeeprn@iitb.ac.in

Wasi Uddin (NH)
30004087@iitb.ac.in

Short Name
Make/ ModelUltech/ NA
Critical ToolNo
Serial NumberNA
FootPrintLenght 5.02 mtr, Breadth 2.15 mtr, Height 2.00 mt
InstallationDate2008
Equipment TypeDeposition, Growth and Annealing systems
LocationNano Lab
AMC Required
Local DealerETS, Bangalore

Mr. Ramesh 09845000788
Actual DealerUltech

8-2, Horim-dong, Dalseo-gu, Dargu, Korea, 704240 Technical Division/ Assistant Manager : Mr. Kyeong-Sin-Kim TEL : 82-53-583-7565 FAX : 82-53-583-6872 H.P : 82-10-4264-3215 E-mail : kskim@ultech.co.kr
SOP SOP/147_SOP.pdf
Training & other policy documentsPOLICY/147_POLICY.pdf
Recipies
Glimpse GLIMPSE/147_Glimpse.pdf
Tool Facilities RequirementsN2O, Oxygen, Nitrogen
AccessOpen
Lab Phone No4411
Substrate allowedSi Wafer
Substrate Dimension4 inch
Chemical allowedNA, Only 4 inch RCA Cleaned Si wafers
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedN2O, Oxygen, Nitrogen
Contamination remarksRCA cleaned wafers only allowed
Last updated on: 20-Jan-2023