Equipment Details

Ultech Furnace Silicon Oxynitride (SiON)

Name of the EquipmentUltech Furnace Silicon Oxynitride (SiON)
OperatorBhimraj Sable
System OwnerPradeep Nyaupane

Short Name
Make/ ModelUltech/ NA
Critical ToolNo
Serial NumberNA
FootPrintLenght 5.02 mtr, Breadth 2.15 mtr, Height 2.00 mt
Equipment TypeDeposition, Growth and Annealing systems
LocationNano Lab
AMC Required
Local DealerETS, Bangalore

Mr. Ramesh 09845000788
Actual DealerUltech

8-2, Horim-dong, Dalseo-gu, Dargu, Korea, 704240 Technical Division/ Assistant Manager : Mr. Kyeong-Sin-Kim TEL : 82-53-583-7565 FAX : 82-53-583-6872 H.P : 82-10-4264-3215 E-mail :
SOP SOP/147_SOP.pdf
Training & other policy documentsPOLICY/147_POLICY.pdf
Glimpse GLIMPSE/147_Glimpse.pdf
Tool Facilities RequirementsN2O, Oxygen, Nitrogen
Lab Phone No4411
Substrate allowedSi Wafer
Substrate Dimension4 inch
Chemical allowedNA, Only 4 inch RCA Cleaned Si wafers
Precursors/ Targets allowed
*Based on stock availability
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedN2O, Oxygen, Nitrogen
Contamination remarksRCA cleaned wafers only allowed
Last updated on: 20-Jul-2023