Equipment Details


Ultech Furnace Low Temperature Oxide (LTO)

Name of the EquipmentUltech Furnace Low Temperature Oxide (LTO)
Categoryclean
Operator
System Owner
Short Name
Make/ ModelUltech, Korea/ Ultech
Critical ToolNo
Serial NumberNA
FootPrintLenght 5.02 mtr, Breadth 2.15 mtr, Height 2.00 fo
InstallationDate2008
Equipment TypeDeposition, Growth and Annealing systems
LocationNano Lab
AMC Required
Local DealerETS, Banglore

Mr. Ramesh ramesh@etsind.com
Actual DealerUltech

8-2, Horim-dong, Dalseo-gu, Dargu, Korea, 704240 Technical Division/ Assistant Manager : Mr. Kyeong-Sin-Kim TEL : 82-53-583-7565 FAX : 82-53-583-6872 H.P : 82-10-4264-3215 E-mail : kskim@ultech.co.kr Mr. Kim / Mr. Kang - kskim@ultech.co.kr / chkang@ultech.co.kr
SOP SOP/149_SOP.pdf
Training & other policy documentsPOLICY/149_POLICY.pdf
Recipies
Glimpse GLIMPSE/149_Glimpse.pdf
Tool Facilities RequirementsChiller water, GN2, PN2, Argon
AccessOpen
Lab Phone No4411
Substrate allowedSi, Ge
Substrate Dimension4 inch and 2 inch wafer
Chemical allowedNA, Si/ SiO2, Ge/ GeO2
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedArgon, Nitrogen
Contamination remarksRCA cleaned wafers only allowed
Last updated on: 20-Jan-2023