Equipment Details


Ultech Furnace n-doped poly

Name of the EquipmentUltech Furnace n-doped poly
Categoryclean
Operator
System Owner
Short Name
Make/ ModelUltech/ NA
Critical ToolNo
Serial NumberNA
FootPrintLenght 5.02 mtr, Breadth 2.15 mtr, Height 2.00mtr
InstallationDate2008
Equipment TypeDeposition, Growth and Annealing systems
LocationNano Lab
AMC Required
Local DealerETS, Bangalore

Mr. Ramesh 09845000788
Actual DealerUltech

8-2, Horim-dong, Dalseo-gu, Dargu, Korea, 704240 Technical Division/ Assistant Manager : Mr. Kyeong-Sin-Kim TEL : 82-53-583-7565 FAX : 82-53-583-6872 H.P : 82-10-4264-3215 E-mail : kskim@ultech.co.kr
SOP SOP/158_SOP.pdf
Training & other policy documentsPOLICY/158_POLICY.pdf
Recipies
Glimpse GLIMPSE/158_Glimpse.pdf
Tool Facilities RequirementsWater, GN2, PN2
AccessOpen
Lab Phone No4411
Substrate allowedSi
Substrate Dimension4 inch
Chemical allowedNA, Si, Si/ SiO2
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedPH3, SiH4, N2
Contamination remarksRCA cleaned wafers are only allowed
Last updated on: 20-Jan-2023