4 inch RCA Clean Station
| Name of the Equipment | 4 inch RCA Clean Station |
| Category | clean (for si) |
| Operator | Minita Surwade (NH) Pankajkumar Gound |
| System Owner | Minita Surwade (NH) minita@iitb.ac.in Pankajkumar Gound p15129@iitb.ac.in |
| Short Name | |
| Make/ Model | Laxmi Instruments/ NA |
| Critical Tool | Yes |
| Serial Number | 200801132 (P O numbe |
| FootPrint | |
| InstallationDate | |
| Equipment Type | Wet chemistry tools |
| Location | Wet Chemistry lab |
| AMC | Required |
| Local Dealer | Rupesh Khule 07208246450(for DI water system) |
| Actual Dealer | Nil Nil |
| SOP | SOP/183_SOP.rar |
| Training & other policy documents | POLICY/183_POLICY.pdf |
| Recipies | RECEPIES/183_RECEPIES.pdf |
| Glimpse | GLIMPSE/183_GLIMPSE.pdf |
| Tool Facilities Requirements | DI water, Hot plate |
| Access | Open |
| Lab Phone No | 4464 |
| Substrate allowed | Si |
| Substrate Dimension | Maximum 4 inch Si wafers |
| Chemical allowed | Ammonium Hydroxide, H2O2, HCl, HF, DI water, Only RCA chemicals and DI water |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | PN2 for drying |
| Contamination remarks | No other chemicals allowed. No glasswares allowed. Only teflon and quartz is allowed. Sodium and potassium contamination strictly prohibited. |