Sputter (ATC 2200)
| Name of the Equipment | Sputter (ATC 2200) |
| Category | semi clean b |
| Operator | |
| System Owner | Shubham Patil (H) 204076008@iitb.ac.in Paritosh Meihar 184076012@iitb.ac.in |
| Short Name | |
| Make/ Model | AJA international, Inc/ ATC 2200 |
| Critical Tool | Yes |
| Serial Number | |
| FootPrint | (l) 2318 mm x (b) 762 mm x (h) 2160mm |
| InstallationDate | 01/25/2014 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Nano Lab |
| AMC | Required |
| Local Dealer | Mr. Varadaraj, Service Executive Engineer Anarghya Innovations and Technology Pvt Ltd, Bengaluru. Ph: +91 80 23376488 M : +91-9743446512 www.anarghyainnotech.com |
| Actual Dealer | Mr. Joe Cronin, Customer Service Engineer AJA International, INC 809 Country Way Scituate, MA 02066 781-545-7365 E-mail: topgun@ajaint.com Web: www.ajaint.com |
| SOP | SOP/196_SOP.pdf |
| Training & other policy documents | POLICY/196_POLICY.pdf |
| Recipies | |
| Glimpse | GLIMPSE/196_GLIMPSE.pdf |
| Tool Facilities Requirements | chiller, process gases |
| Access | Open |
| Lab Phone No | 4411 |
| Substrate allowed | Si, Ge |
| Substrate Dimension | Min - 1cm x 1cm, Max - 4 inch wafer |
| Chemical allowed | IPA, Si, Ge |
| Precursors/ Targets allowed *Based on stock availability | Ti, W, Ta, SiO2, TiO2, Al2O3, PrMnO, CaMnO, LaMnO, SrMnO, MgO, TiN, Ge, Pt, HfO2, Gd2O3, p-Si, PCMO, ZrO2 |
| Precursor/ Target loaded inside tool | |
| Target dimension | 2 inch diameter, 0.250 inch thickness |
| Gases allowed | Ar, N2 |
| Contamination remarks | 1. Targets used in orion cannot be used in ATC 2200 sputter as Orion is Cu and Au contaminated. Separate (dedicated) targets are to be used for ATC. 2. Resist coated samples are not allowed (yet to be tested) 3. Au/ Cu coated samples are not allowed. |