Equipment Details

Sputter (ATC 2200)

Name of the EquipmentSputter (ATC 2200)
Categorysemi clean b
System OwnerShubham Patil (H)

Paritosh Meihar

Short Name
Make/ ModelAJA international, Inc/ ATC 2200
Critical ToolYes
Serial Number
FootPrint(l) 2318 mm x (b) 762 mm x (h) 2160mm
Equipment TypeDeposition, Growth and Annealing systems
LocationNano Lab
AMC Required
Local Dealer

Mr. Varadaraj, Service Executive Engineer Anarghya Innovations and Technology Pvt Ltd, Bengaluru. Ph: +91 80 23376488 M : +91-9743446512
Actual Dealer

Mr. Joe Cronin, Customer Service Engineer AJA International, INC 809 Country Way Scituate, MA 02066 781-545-7365 E-mail: Web:
SOP SOP/196_SOP.pdf
Training & other policy documentsPOLICY/196_POLICY.pdf
Glimpse GLIMPSE/196_GLIMPSE.pdf
Tool Facilities Requirementschiller, process gases
Lab Phone No4411
Substrate allowedSi, Ge
Substrate DimensionMin - 1cm x 1cm, Max - 4 inch wafer
Chemical allowedIPA, Si, Ge
Precursors/ Targets allowed
*Based on stock availability
Ti, W, Ta, SiO2, TiO2, Al2O3, PrMnO, CaMnO, LaMnO, SrMnO, MgO, TiN, Ge, Pt, HfO2, Gd2O3, p-Si, PCMO, ZrO2
Precursor/ Target loaded inside tool
Target dimension2 inch diameter, 0.250 inch thickness
Gases allowedAr, N2
Contamination remarks1. Targets used in orion cannot be used in ATC 2200 sputter as Orion is Cu and Au contaminated. Separate (dedicated) targets are to be used for ATC. 2. Resist coated samples are not allowed (yet to be tested) 3. Au/ Cu coated samples are not allowed.
Last updated on: 20-Jan-2023