Equipment Details


Sputter (Orion)

Name of the EquipmentSputter (Orion)
Categorygold contaminated
OperatorHemant Kshirsagar
Minita Surwade (NH)
System OwnerAbhishek Erram
204070024@iitb.ac.in

Akanksha Chouhan
174070019@iitb.ac.in

Short Name
Make/ ModelAJA international, Inc/ Orion Sputter PHASE
Critical ToolYes
Serial NumberDIT/11/EQP/012/12/00
FootPrint(l) 2318 mm x (b) 762 mm x (h) 2160mm
InstallationDate01/25/2014
Equipment TypeDeposition, Growth and Annealing systems
LocationNano Lab
AMC Required
Local Dealer

Mr. Varadaraj, Service Executive Engineer Anarghya Innovations and Technology Pvt Ltd, Bengaluru. Ph: +91 80 23376488 M : +91-9743446512 www.anarghyainnotech.com
Actual DealerAJA

Mr. Joe Cronin, Customer Service Engineer AJA International, INC 809 Country Way Scituate, MA 02066 781-545-7365 E-mail: topgun@ajaint.com Web: www.ajaint.com
SOP SOP/197_SOP.pdf
Training & other policy documentsPOLICY/197_POLICY.pdf
Recipies RECEPIES/197_RECEPIES.pdf
Glimpse GLIMPSE/197_GLIMPSE.pdf
Tool Facilities Requirementschiller, process gases
AccessControlled
Lab Phone No4411
Substrate allowedSi, Ge, GaN,GaAs,LSMO,PCMO,YIG,SRO, (No Glass),Lithium Niobate
Substrate DimensionSample height not more than 3 mm
Chemical allowedIPA, Photoresist, ebeam resist, Nb, NbN, Yb, Sn, Ge, Pt, Au, Gd, IrMn, Cr, YIG, Fe, Ni, Ta, Cu, Ru, Cr, MgO, Al2O3, SnGe alloy, Ti, CoFeB, SiO2, Al, Co, W, Ag, NiFe
Precursors/ Targets allowed
*Based on stock availability
Yb, Sn, Ge, Pt, Gd, IrMn, Cr,Fe, Ni, Ta, Cu, Ru, Cr, MgO, Al2O3, SnGe alloy, Ti, CoFeB, SiO2, Al, Co, W, Ag, NiFe
Precursor/ Target loaded inside tool
Target dimension2 inch diameter, 0.250 inch thickness
Gases allowedAr, N2, CDA
Contamination remarksIf someone wants to introduce new material/target, he/she needs to get permission for that.Na+ and K+ are not allowed. For outside/ NCPRE/ Org electronics lab samples, contact SO/ Process engineer.
Last updated on: 20-Jan-2023