Equipment Details


ALD

Name of the EquipmentALD
Categorysemi clean b
OperatorAnjum Ahmed (NH)
System OwnerAnjum Ahmed (NH)
anjum04@iitb.ac.in

Short NameNA
Make/ ModelCambridge Nanotechnology Ultratech SE Asia Pte. Lt
Critical ToolYes
Serial NumberNA
FootPrint1.01 mtrs X 0.56 mtrs
InstallationDate01/20/2014
Equipment TypeDeposition, Growth and Annealing systems
LocationNano Lab
AMC Required
Local DealerSujata Singh sujata@dynotech.in 09560766116

Dynotech Instruments Pvt. Ltd. 803-804, Vishwa Sadan, District Centre, Janak Puri, New Delhi- 100 058 Ph: 91-11-2561 2270 Email: sales@dynotech.in Contact Person: Sujata Singh sujata@dynotech.in
Actual DealerUltratech SE Asia Pte. Ltd.

Ultratech SE Asia Pte. Ltd. Company Registration No. 20102976Z No. 02-01, 1 Kaki Bukit View, Techview, Singapore 415941
SOP SOP/199_SOP.pdf
Training & other policy documentsPOLICY/199_POLICY.pdf
Recipies RECEPIES/199_RECEPIES.rar
Glimpse GLIMPSE/199_GLIMPSE.pdf
Tool Facilities RequirementsChiller water, PN2, GN2, O2, Ar, NH3
AccessOpen
Lab Phone No4411
Substrate allowedSilicon, Germanium, III-V substrates
Substrate Dimension1cm X 1cm upto 6 inch
Chemical allowedTetrakis(dimethylamido)hafnium(IV), Tetrakis(dimethylamido)zirconium(IV), Tetrakis(DIMETHYLAMIDO)Titanium(IV), Trimethyl aluminium, Diethyl zinc, Tetrakis(dimethylamino)silane, Diethylamine, Nickel, Molybdenum, HF-pyridine, NA
Precursors/ Targets allowed
*Based on stock availability
Al, Ti, Hf, Zr, Zn, Si, Mo
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedNitrogen, Oxygen, Argon, Ammonia
Contamination remarksSamples from gold contaminated tools when processed without a separate carrier wafer and having photoresist not allowed. Samples with Na and K not allowed
Last updated on: 20-Jul-2022