ALD LL
| Name of the Equipment | ALD LL |
| Category | semi clean b |
| Operator | Anjum Khan |
| System Owner | Anjum Khan anjum04@iitb.ac.in |
| Short Name | |
| Make/ Model | Cambridge Nanotechnology Ultratech SE Asia Pte. Lt |
| Critical Tool | Yes |
| Serial Number | NA |
| FootPrint | 1.7mtrs X 0.56 mtrs |
| InstallationDate | 01/20/2014 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Nano Lab |
| AMC | Required |
| Local Dealer | Sujata Singh sujata@dynotech.in Dynotech Instruments Pvt. Ltd. 803-804, Vishwa Sadan, District Centre, Janak Puri, New Delhi- 100 058 Ph: 91-11-2561 2270 Email: sales@dynotech.in Contact Person: Sujata Singh sujata@dynotech.in |
| Actual Dealer | Ultratech SE Asia Pte. Ltd. Ultratech SE Asia Pte. Ltd. Company Registration No. 20102976Z No. 02-01, 1 Kaki Bukit View, Techview, Singapore � 415941 |
| SOP | SOP/200_SOP.pdf |
| Training & other policy documents | POLICY/200_POLICY.pdf |
| Recipies | RECEPIES/200_RECEPIES.rar |
| Glimpse | GLIMPSE/200_GLIMPSE.pdf |
| Tool Facilities Requirements | Chiller water, PN2, GN2, O2, Ar, NH3 |
| Access | Controlled |
| Lab Phone No | 4411 |
| Substrate allowed | Silicon, Germanium |
| Substrate Dimension | 1cm X 1cm upto 6 inch |
| Chemical allowed | Tetrakis(dimethylamido)hafnium(IV), Tetrakis(dimethylamido)titanium(IV), Trimethyl aluminium, NA |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | Nitrogen, Oxygen, Argon, Ammonia |
| Contamination remarks | Samples from gold contaminated tools and having photoresist not allowed.Samples with Na and K not allowed |