Electroplating system - Au/Ni/Cu
Name of the Equipment | Electroplating system - Au/Ni/Cu |
Category | gold contaminated |
Operator | Minita Surwade (NH) Pankajkumar Gound |
System Owner | Minita Surwade (NH) minita@iitb.ac.in |
Short Name | |
Make/ Model | Assembled/ |
Critical Tool | No |
Serial Number | |
FootPrint | |
InstallationDate | |
Equipment Type | Deposition, Growth and Annealing systems |
Location | EC Lab |
AMC | Not Required |
Local Dealer | |
Actual Dealer | |
SOP | SOP/202_SOP.rar |
Training & other policy documents | |
Recipies | RECEPIES/202_RECEPIES.pdf |
Glimpse | GLIMPSE/202_GLIMPSE.pdf |
Tool Facilities Requirements | |
Access | Open |
Lab Phone No | No Number |
Substrate allowed | |
Substrate Dimension | |
Chemical allowed | , |
Precursors/ Targets allowed *Based on stock availability | |
Precursor/ Target loaded inside tool | |
Target dimension | |
Gases allowed | |
Contamination remarks | Outside samples need approval. For Ni electroplating: Ni electroplating solution is having Na & K elements,so sample processed in this should not enter into other IITBNF lab tools. |