| Name of the Equipment | PLD III |
| Category | clean |
| Operator | |
| System Owner | |
| Short Name | |
| Make/ Model | / |
| Critical Tool | Yes |
| Serial Number | |
| FootPrint | |
| InstallationDate | |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Nanoelectronics Processing Lab (NanoE bldg, 1st floor) |
| AMC | Required |
| Local Dealer | Subash Pai
Dr. Subhash Pai
Excel Instruments Gala no. 9 & 10, Bldg no.2, Dias Industrial Estate, Sativali Naka, Vasai (E), Palghar - 401 208. Ph: 91 250 2480377 www.excelinstruments.biz Cell: 9867312963 |
| Actual Dealer | Excel Instruments
Dr. Subhash Pai
Excel Instruments Gala no. 9 & 10, Bldg no.2, Dias Industrial Estate, Sativali Naka,Vasai (E), Palghar - 401 208. Ph: 91 250 2480377 www.excelinstruments.biz Cell: 9867312963 |
| SOP | |
| Training & other policy documents | |
| Recipies | |
| Glimpse | |
| Tool Facilities Requirements | |
| Access | Controlled |
| Lab Phone No | 4488 Ext Flash 107 OR 111 |
| Substrate allowed | Si, Ge, GaN |
| Substrate Dimension | |
| Chemical allowed | NA, Gd2O3, HfO2, La2O3, LaAlO2, GdScO2, Re2O3, Sc2O3, ZrO2, PCMO (All are of 4N purity) |
Precursors/ Targets allowed
*Based on stock availability | Gd2O3 (Targets are for personal use) |
| Precursor/ Target loaded inside tool | |
| Target dimension | Diameter = 0.5 inch (min.), 2 inch (max.) |
| Gases allowed | N2, Ar, O2 (At least 4N purity) |
| Contamination remarks | |
