| Name of the Equipment | Laser 2_4 |
| Category | clean |
| Operator | |
| System Owner | |
| Short Name | |
| Make/ Model | / |
| Critical Tool | No |
| Serial Number | |
| FootPrint | |
| InstallationDate | |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Nanoelectronics Processing Lab (NanoE bldg, 1st floor) |
| AMC | Required |
| Local Dealer |
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| Actual Dealer |
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| SOP | |
| Training & other policy documents | |
| Recipies | |
| Glimpse | |
| Tool Facilities Requirements | |
| Access | Open |
| Lab Phone No | 4488 Ext Flash 107 OR 111 |
| Substrate allowed | |
| Substrate Dimension | |
| Chemical allowed | , |
Precursors/ Targets allowed
*Based on stock availability | |
| Precursor/ Target loaded inside tool | |
| Target dimension | |
| Gases allowed | |
| Contamination remarks | |
