| Name of the Equipment | LPCVD Furnace_Thermal oxidation |
| Category | clean |
| Operator | Hemant Kshirsagar
|
| System Owner | Anjum Khan
anjum04@iitb.ac.in
Hemant Kshirsagar
hemant@ee.iitb.ac.in
|
| Short Name | |
| Make/ Model | SVCS |
| Critical Tool | Yes |
| Serial Number | |
| FootPrint | |
| InstallationDate | |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | NMPF Lab |
| AMC | Required |
| Local Dealer | Akshay
|
| Actual Dealer |
info@svcs.cs |
| SOP | |
| Training & other policy documents | |
| Recipies | |
| Glimpse | |
| Tool Facilities Requirements | |
| Access | Controlled |
| Lab Phone No | 6287 |
| Substrate allowed | |
| Substrate Dimension | |
| Chemical allowed | , |
Precursors/ Targets allowed
*Based on stock availability | |
| Precursor/ Target loaded inside tool | 63 |
| Target dimension | |
| Gases allowed | |
| Contamination remarks | Only RCA cleaned wafers allowed. Processed wafers not allowed. |
