| Name of the Equipment | NMPF Wetbench_2 inch RCA Piranha |
| Category | clean |
| Operator | |
| System Owner | Hemant Kshirsagar
hemant@ee.iitb.ac.in
Anjum Khan
anjum04@iitb.ac.in
|
| Short Name | |
| Make/ Model | |
| Critical Tool | Yes |
| Serial Number | |
| FootPrint | |
| InstallationDate | |
| Equipment Type | Wet chemistry tools |
| Location | NMPF Lab |
| AMC | Required |
| Local Dealer |
|
| Actual Dealer |
|
| SOP | |
| Training & other policy documents | |
| Recipies | |
| Glimpse | |
| Tool Facilities Requirements | PN2, DI water, Blowers, hot plate |
| Access | Open |
| Lab Phone No | 4435 |
| Substrate allowed | Si, Quartz, Diamond, Sapphire |
| Substrate Dimension | 2 inch maximum |
| Chemical allowed | HCl, H2O2. NH4OH, HF, DI water, |
Precursors/ Targets allowed
*Based on stock availability | NA |
| Precursor/ Target loaded inside tool | 63 |
| Target dimension | NA |
| Gases allowed | PN2 |
| Contamination remarks | Only new Si wafers are allowed for RCA.
Piranha can be done for processed as well as new wafers. |
