Equipment Details

Plasma Doping System

Name of the EquipmentPlasma Doping System
Categorysemi clean b
OperatorShilpa Kharat
System OwnerRowtu Srinu (H)

Short Name
Make/ ModelUltech
Critical ToolYes
Serial NumberImpulse 100Series
Equipment TypeDeposition, Growth and Annealing systems
LocationNanoelectronics Processing Lab (NanoE bldg, 1st floor)
AMC Required
Local DealerTesscorn Nano Science Inc.

Tesscorn Nano Science Inc. 1285, 5 th Main, 17 th Cross, HSR Sector 7, Bangalore 560102. Landline: +91.80.2572.9425
Actual DealerULTECH Co. Ltd

ULTECH Co.,Ltd. South Korea
SOP SOP/343_SOP.pdf
Training & other policy documentsPOLICY/343_POLICY.pdf
Tool Facilities Requirements
Lab Phone No8025729425
Substrate allowedSi, Ge, C, Sn
Substrate DimensionMax 4 inch
Chemical allowed-, only Group IV (Si, Ge, C, Sn) allowed.
Precursors/ Targets allowed
*Based on stock availability
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedPH3, B2H6, Ar, CHF3 , SiH4, O2, N2
Contamination remarksonly Group IV (Si, Ge, C, Sn) allowed.
Last updated on: 20-Jan-2023