Rapid Thermal Processing GaN (RTP GaN)
Name of the Equipment | Rapid Thermal Processing GaN (RTP GaN) |
Category | gold contaminated |
Operator | Pankajkumar Gound Nikhil (NH) Palkar |
System Owner | Kanchan Singh Rana 204070029@iitb.ac.in |
Short Name | |
Make/ Model | Annealsys AS-one 100 |
Critical Tool | Yes |
Serial Number | |
FootPrint | 550mm(W) x 800mm(D) |
InstallationDate | 08/15/2022 |
Equipment Type | Deposition, Growth and Annealing systems |
Location | Nanoelectronics Processing Lab (NanoE bldg, 1st floor) |
AMC | Required |
Local Dealer | El Camino Technologies Pvt. Ltd. El Camino Technologies Pvt. Ltd. #8, 1st block, 1st main, BEL Layout, Vidyaranyapura, Bangalore - 560097, INDIA. Tel: 91 80 23640503 Contact Person: Amaresh.N.G, Maintenance Engineer, MOB NO - 09900836368 e-mail: maintenance@elcamino.in, Contact Person: 1) Chetna Mohan: chetnamohan@elcamino.in 2) Amaresh N G: maintenance@elcamino.in (+919900836368) |
Actual Dealer | AnnealSys Annealsys Bat T2, PIT de la Pompignane, Rue de la Vieille Poste, 34055 Montpellier Cedex 1, France Phone: +33 467 20 23 63 Email: info@annealsys.com Contact Person(s): 1) Frank Laporte: flaporte@annealsys.com, 2) 2) Albin Diranzo: adiranzo@annealsys.com |
SOP | SOP/351_SOP.pdf |
Training & other policy documents | POLICY/351_POLICY.pdf |
Recipies | |
Glimpse | GLIMPSE/351_GLIMPSE.pdf |
Tool Facilities Requirements | Chiller water, PN2, GN2, O2, Ar, H2 |
Access | Controlled |
Lab Phone No | 4488 Ext Flash 107 OR 111 |
Substrate allowed | GaAs, GaN, Sapphire |
Substrate Dimension | For GaAs/ GaN/ Sapp hire/ Germanium: 0.5cm x 0.5cm to 3 inches wafer |
Chemical allowed | NA, GaN, GaAs, AlGaN |
Precursors/ Targets allowed *Based on stock availability | NA |
Precursor/ Target loaded inside tool | 47,1 |
Target dimension | NA |
Gases allowed | Nitrogen, Oxygen, Argon, H2 |
Contamination remarks | Gold contaminated, Outside samples, NCPRE Samples, OE Lab, Na+ & K+ not allowed further information contact SO/Process InCharge |