Equipment Details


Rapid Thermal Processing GaN (RTP GaN)

Name of the EquipmentRapid Thermal Processing GaN (RTP GaN)
Categorygold contaminated
OperatorPankajkumar Gound
Nikhil (NH) Palkar
System OwnerKanchan Singh Rana
204070029@iitb.ac.in

Short Name
Make/ ModelAnnealsys AS-one 100
Critical ToolYes
Serial Number
FootPrint550mm(W) x 800mm(D)
InstallationDate08/15/2022
Equipment TypeDeposition, Growth and Annealing systems
LocationNanoelectronics Processing Lab (NanoE bldg, 1st floor)
AMC Required
Local DealerEl Camino Technologies Pvt. Ltd.

El Camino Technologies Pvt. Ltd. #8, 1st block, 1st main, BEL Layout, Vidyaranyapura, Bangalore - 560097, INDIA. Tel: 91 80 23640503 Contact Person: Amaresh.N.G, Maintenance Engineer, MOB NO - 09900836368 e-mail: maintenance@elcamino.in, Contact Person: 1) Chetna Mohan: chetnamohan@elcamino.in 2) Amaresh N G: maintenance@elcamino.in (+919900836368)
Actual DealerAnnealSys

Annealsys Bat T2, PIT de la Pompignane, Rue de la Vieille Poste, 34055 Montpellier Cedex 1, France Phone: +33 467 20 23 63 Email: info@annealsys.com Contact Person(s): 1) Frank Laporte: flaporte@annealsys.com, 2) 2) Albin Diranzo: adiranzo@annealsys.com
SOP SOP/351_SOP.pdf
Training & other policy documentsPOLICY/351_POLICY.pdf
Recipies
Glimpse GLIMPSE/351_GLIMPSE.pdf
Tool Facilities RequirementsChiller water, PN2, GN2, O2, Ar, H2
AccessControlled
Lab Phone No4488 Ext Flash 107 OR 111
Substrate allowedGaAs, GaN, Sapphire
Substrate DimensionFor GaAs/ GaN/ Sapp hire/ Germanium: 0.5cm x 0.5cm to 3 inches wafer
Chemical allowedNA, GaN, GaAs, AlGaN
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool47,1
Target dimensionNA
Gases allowedNitrogen, Oxygen, Argon, H2
Contamination remarksGold contaminated, Outside samples, NCPRE Samples, OE Lab, Na+ & K+ not allowed further information contact SO/Process InCharge
Last updated on: 20-Jan-2023