Equipment Details

Rapid Thermal Processing GaN (RTP GaN)

Name of the EquipmentRapid Thermal Processing GaN (RTP GaN)
Categorygold contaminated
OperatorPankajkumar Gound
Nikhil (NH) Palkar
System OwnerKanchan Singh Rana

Short Name
Make/ ModelAnnealsys AS-one 100
Critical ToolYes
Serial Number
FootPrint550mm(W) x 800mm(D)
Equipment TypeDeposition, Growth and Annealing systems
LocationNanoelectronics Processing Lab (NanoE bldg, 1st floor)
AMC Required
Local DealerEl Camino Technologies Pvt. Ltd.

El Camino Technologies Pvt. Ltd. #8, 1st block, 1st main, BEL Layout, Vidyaranyapura, Bangalore - 560097, INDIA. Tel: 91 80 23640503 Contact Person: Amaresh.N.G, Maintenance Engineer, MOB NO - 09900836368 e-mail:, Contact Person: 1) Chetna Mohan: 2) Amaresh N G: (+919900836368)
Actual DealerAnnealSys

Annealsys Bat T2, PIT de la Pompignane, Rue de la Vieille Poste, 34055 Montpellier Cedex 1, France Phone: +33 467 20 23 63 Email: Contact Person(s): 1) Frank Laporte:, 2) 2) Albin Diranzo:
SOP SOP/351_SOP.pdf
Training & other policy documentsPOLICY/351_POLICY.pdf
Glimpse GLIMPSE/351_GLIMPSE.pdf
Tool Facilities RequirementsChiller water, PN2, GN2, O2, Ar, H2
Lab Phone No4488 Ext Flash 107 OR 111
Substrate allowedGaAs, GaN, Sapphire
Substrate DimensionFor GaAs/ GaN/ Sapp hire/ Germanium: 0.5cm x 0.5cm to 3 inches wafer
Chemical allowedNA, GaN, GaAs, AlGaN
Precursors/ Targets allowed
*Based on stock availability
Precursor/ Target loaded inside tool47,1
Target dimensionNA
Gases allowedNitrogen, Oxygen, Argon, H2
Contamination remarksGold contaminated, Outside samples, NCPRE Samples, OE Lab, Na+ & K+ not allowed further information contact SO/Process InCharge
Last updated on: 20-Jan-2023