Hot wire CVD(HWCVD)
| Name of the Equipment | Hot wire CVD(HWCVD) |
| Category | gold contaminated |
| Operator | Anjum Khan |
| System Owner | Anjum Khan anjum04@iitb.ac.in |
| Short Name | |
| Make/ Model | Indigenious Assembled System/ NA |
| Critical Tool | No |
| Serial Number | NA |
| FootPrint | 13 x 11 ft |
| InstallationDate | 2006 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Micro2 Lab |
| AMC | Required |
| Local Dealer | Excel Instruments, Andheri Subhash Pai Ph: 022 65008911 Jeetlal: 9004611185 |
| Actual Dealer | Subhash Pai Ph: 022 65008911 |
| SOP | SOP/5_SOP.pdf |
| Training & other policy documents | POLICY/5_Policy.pdf |
| Recipies | RECEPIES/5_RECEPIES.pdf |
| Glimpse | GLIMPSE/5_Glimpse.pdf |
| Tool Facilities Requirements | Chilled water, GN2, PN2, Silane, Ammonia, Diborane, Hydrogen gases |
| Access | Open |
| Lab Phone No | 4464 |
| Substrate allowed | Si, Glass, Quartz |
| Substrate Dimension | Min- 1cmx1cm, Max- 2 inch wafer |
| Chemical allowed | Methanol for cleaning, SiNx, SiO2, Materials allowed at low substrate temp- SU8, Au, Al, Cu |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | SiH4, NH3, N2, H2, B2H6 |
| Contamination remarks |