Equipment Details

Rapid Thermal Processing_Nano lab_General

Name of the EquipmentRapid Thermal Processing_Nano lab_General
Categorygold contaminated
OperatorPankajkumar Gound
Shahiroze Khetani
Minita Surwade (NH)
System OwnerArpit Sahu

Short Name
Make/ ModelAnnealSys- AS-ONE 150/ AS-ONE 150
Critical ToolYes
Serial NumberNA
FootPrint2 Meters by 1meter
Equipment TypeDeposition, Growth and Annealing systems
LocationNano Lab
AMC Required
Local DealerEl Camino Technologies Pvt. Ltd.

El Camino Technologies Pvt. Ltd. #8, 1st block, 1st main, BEL Layout, Vidyaranyapura, Bangalore - 560097, INDIA. Tel: 91 80 23640503 Contact Person: Amaresh.N.G, Maintenance Engineer, MOB NO - 09900836368 e-mail:, Contact Person: 1) Chetna Mohan: 2) Amaresh N G: (+919900836368)
Actual DealerAnnealSys

Annealsys Bat T2, PIT de la Pompignane, Rue de la Vieille Poste, 34055 Montpellier Cedex 1, France Phone: +33 467 20 23 63 Email: Contact Person(s): 1) Frank Laporte:, 2) 2) Albin Diranzo:
Training & other policy documentsPOLICY/7_POLICY.pdf
Tool Facilities RequirementsChiller water, PN2, GN2, O2, Ar, FGA
Lab Phone No4411
Substrate allowedSilicon, GaAs, GaN, Sapphire, Germanium
Substrate DimensionFor Si: approx. 1/4 of 2 inch to12 inch. For GaAs/ GaN/ Sapp hire/ Germanium: 0.5cm x 0.5cm to aroun
Chemical allowedNA, NA
Precursors/ Targets allowed
*Based on stock availability
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedNitrogen, Oxygen, Argon, FGA
Contamination remarksGold contaminated, Outside samples, NCPRE Samples, OE Lab, Na+ & K+ not allowed further information contact SO/Process InCharge
Last updated on: 20-Jan-2023