Rapid Thermal Processing_Nano lab_General
| Name of the Equipment | Rapid Thermal Processing_Nano lab_General |
| Category | gold contaminated |
| Operator | Pankajkumar Gound Shahiroze Khetani Minita Surwade (NH) |
| System Owner | Arpit Sahu arpitsahu@ee.iitb.ac.in |
| Short Name | |
| Make/ Model | AnnealSys- AS-ONE 150/ AS-ONE 150 |
| Critical Tool | Yes |
| Serial Number | NA |
| FootPrint | 2 Meters by 1meter |
| InstallationDate | 02/01/2008 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Nano Lab |
| AMC | Required |
| Local Dealer | El Camino Technologies Pvt. Ltd. El Camino Technologies Pvt. Ltd. #8, 1st block, 1st main, BEL Layout, Vidyaranyapura, Bangalore - 560097, INDIA. Tel: 91 80 23640503 Contact Person: Amaresh.N.G, Maintenance Engineer, MOB NO - 09900836368 e-mail: maintenance@elcamino.in, Contact Person: 1) Chetna Mohan: chetnamohan@elcamino.in 2) Amaresh N G: maintenance@elcamino.in (+919900836368) |
| Actual Dealer | AnnealSys Annealsys Bat T2, PIT de la Pompignane, Rue de la Vieille Poste, 34055 Montpellier Cedex 1, France Phone: +33 467 20 23 63 Email: info@annealsys.com Contact Person(s): 1) Frank Laporte: flaporte@annealsys.com, 2) 2) Albin Diranzo: adiranzo@annealsys.com |
| SOP | SOP/7_SOP.pdf |
| Training & other policy documents | POLICY/7_POLICY.pdf |
| Recipies | |
| Glimpse | GLIMPSE/7_GLIMPSE.pdf |
| Tool Facilities Requirements | Chiller water, PN2, GN2, O2, Ar, FGA |
| Access | Open |
| Lab Phone No | 4411 |
| Substrate allowed | Silicon, GaAs, GaN, Sapphire, Germanium |
| Substrate Dimension | For Si: approx. 1/4 of 2 inch to12 inch. For GaAs/ GaN/ Sapp hire/ Germanium: 0.5cm x 0.5cm to aroun |
| Chemical allowed | NA, NA |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | Nitrogen, Oxygen, Argon, FGA |
| Contamination remarks | Gold contaminated, Outside samples, NCPRE Samples, OE Lab, Na+ & K+ not allowed further information contact SO/Process InCharge |