Equipment Details

Plasma Immersion Ion Implantation (PIII)

Name of the EquipmentPlasma Immersion Ion Implantation (PIII)
Categorysemi clean b
OperatorAnjum Khan
System OwnerAnjum Khan

Short Name
Make/ ModelIndigenious Assembled System/ NA
Critical ToolYes
Serial NumberNA
FootPrint9 x 9.5 feet
Equipment TypeMiscellaneous
LocationMicro2 Lab
AMC Required
Local DealerExcel Instruments

Excel Instruments, Andheri Subhash Pai Ph: 022 65008911 Jeetlal: 9004611185
Actual DealerIndigenious Assembled System

Subhash Pai Ph: 022 65008911
SOP SOP/73_SOP.pdf
Training & other policy documentsPOLICY/73_POLICY.pdf
Glimpse GLIMPSE/73_Glimpse.pdf
Tool Facilities RequirementsChilled water, GN2, PN2, Diborane, Phosphine gases
Lab Phone No4464
Substrate allowedSi, Ge
Substrate DimensionMax 4 inch wafer
Chemical allowedPPR, PMMA, SiO2, SiNx, a-Si, Si, SiGe, Ge, Ni, Co, Pt, Al, Hf, Ta, Mo, W, Ti, Cr, Zr, Pd
Precursors/ Targets allowed
*Based on stock availability
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedB2H6, PH3
Contamination remarksSamples from gold contaminated tools are not allowed
Last updated on: 20-Jan-2023