2 inch Boron_Solid source Diffusion Furnace
| Name of the Equipment | 2 inch Boron_Solid source Diffusion Furnace |
| Category | clean |
| Operator | |
| System Owner | Pankajkumar Gound p15129@iitb.ac.in |
| Short Name | |
| Make/ Model | General Signals-Tempress/ NA |
| Critical Tool | Yes |
| Serial Number | NA |
| FootPrint | 3.75ft x13ft |
| InstallationDate | 11/11/2004 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Micro1 Lab |
| AMC | Required |
| Local Dealer | NA inhouse maintenance |
| Actual Dealer | NA NA |
| SOP | SOP/76_SOP.pdf |
| Training & other policy documents | POLICY/76_POLICY.rar |
| Recipies | |
| Glimpse | GLIMPSE/76_Glimpse.pdf |
| Tool Facilities Requirements | Gases, chiller, Exhaust |
| Access | Open |
| Lab Phone No | 4405 |
| Substrate allowed | Si Wafer with RCA cleaning or Piranha cleaning as the immediate previous process allowed |
| Substrate Dimension | Quarter of 2inch, 2inch |
| Chemical allowed | Spin on chemicals are not allowed, only silicon wafers (others under contamination clearance) |
| Precursors/ Targets allowed *Based on stock availability | BNN975 solid diffusion source from sain gobain |
| Precursor/ Target loaded inside tool | |
| Target dimension | BNN975 solid diffusion source from sain gobain |
| Gases allowed | N2, O2 |
| Contamination remarks | Photo resist spun wafers not to be used |