2 inch Phosphorous_Solid source Diffusion Furnace
| Name of the Equipment | 2 inch Phosphorous_Solid source Diffusion Furnace |
| Category | clean |
| Operator | |
| System Owner | Pankajkumar Gound p15129@iitb.ac.in |
| Short Name | |
| Make/ Model | assembled/ NA |
| Critical Tool | Yes |
| Serial Number | NA |
| FootPrint | 3.75 ft x13 ft |
| InstallationDate | 12/03/2003 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Micro1 Lab |
| AMC | Required |
| Local Dealer | NA Inhouse |
| Actual Dealer | NA Inhouse |
| SOP | SOP/81_SOP.pdf |
| Training & other policy documents | |
| Recipies | |
| Glimpse | GLIMPSE/81_Glimpse.pdf |
| Tool Facilities Requirements | chiller & Exhaust |
| Access | Open |
| Lab Phone No | 4405 |
| Substrate allowed | Si Wafer with RCA cleaning or Piranha cleaning as the immediate previous process allowed |
| Substrate Dimension | Quarter of 2 inch, Half of 2 inch, 2 inch |
| Chemical allowed | Spin on chemicals are not allowed, only silicon wafers (others under contamination clearance) |
| Precursors/ Targets allowed *Based on stock availability | PH1025, PH900 PH 950 solid diffusion sources from saint gobain |
| Precursor/ Target loaded inside tool | |
| Target dimension | 2 inch only |
| Gases allowed | N2, O2 |
| Contamination remarks | clean |