Dielectric - sputter System
| Name of the Equipment | Dielectric - sputter System |
| Category | gold contaminated |
| Operator | Minita Surwade (NH) Shilpa Kharat |
| System Owner | Minita Surwade (NH) minita@iitb.ac.in Madhuri Mishra madhuri016@ee.iitb.ac.in |
| Short Name | |
| Make/ Model | Advanced Process Techonology/ |
| Critical Tool | Yes |
| Serial Number | |
| FootPrint | 120 |
| InstallationDate | 08/04/2005 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Micro1 Lab |
| AMC | Available |
| Local Dealer | NA NA |
| Actual Dealer | NA NA |
| SOP | SOP/84_SOP.pdf |
| Training & other policy documents | |
| Recipies | RECEPIES/84_RECEPIES.pdf |
| Glimpse | GLIMPSE/84_Glimpse.pdf |
| Tool Facilities Requirements | Chiller |
| Access | Open |
| Lab Phone No | 4405 |
| Substrate allowed | Glass, Si, Ge, Sapphire, Quartz, GaN |
| Substrate Dimension | maximun size 2 inch |
| Chemical allowed | NA, ppr, su8, PMMA, gold, Cu & other metals |
| Precursors/ Targets allowed *Based on stock availability | SiO2, HfO2, ZnO, ZnMgO |
| Precursor/ Target loaded inside tool | |
| Target dimension | SiO2, HfO2, ZnO, ZnMgO |
| Gases allowed | oxygen & Argon And Nitrogen |
| Contamination remarks | Mg exception |