Equipment Details

Plasma asher

Name of the EquipmentPlasma asher
Categorygold contaminated
OperatorShilpa Kharat
Minita Surwade (NH)
System OwnerAnuj Kumar Singh

Shilpa Kharat

Short Name
Make/ ModelFabricated in CEN/ NA
Critical ToolYes
Serial NumberNA
FootPrintwidth=0.69m, Depth 1.2m, Height 1.56m
Equipment TypeDry Etch tools
LocationNanoelectronics Processing Lab (NanoE bldg, 1st floor)
AMC Required
Local DealerNA

Actual DealerNA

SOP SOP/87_SOP.pdf
Training & other policy documents
Glimpse GLIMPSE/87_GLIMPSE.pdf
Tool Facilities RequirementsWater connection, Oxygen, CHF3
Lab Phone No4488 Ext Flash 107 OR 111
Substrate allowedQuartz, Si
Substrate Dimensionmaximun size 2 inch
Chemical allowedNA, ppr, su8, cblack, PDMS, PMMA, metals, oxides, Polymer(VDF-TrFe0/ BaTiO3
Precursors/ Targets allowed
*Based on stock availability
Precursor/ Target loaded inside tool
Target dimensionNA
Gases allowedOxygen, CF4, CHF3
Contamination remarksPowdered material not allowed. And Na+ and K+ are not allowed. For outside/ NCPRE/ Org electronics lab samples, contact SO/ Process engineer.
Last updated on: 20-Jan-2023