Karl Suss MJB3 Mask Aligner
| Name of the Equipment | Karl Suss MJB3 Mask Aligner |
| Category | litho/analytical |
| Operator | |
| System Owner | |
| Short Name | |
| Make/ Model | SUSS MicroTec/ MJB-3 |
| Critical Tool | No |
| Serial Number | |
| FootPrint | |
| InstallationDate | 12/01/1985 |
| Equipment Type | Lithography tools |
| Location | Applied Quantum Mechanics Lab 3(NanoE bldg, 5th floor) |
| AMC | Required |
| Local Dealer | Anand Vairagar - OM Scientific M/s OmScientific, Pune, Shailesh Latey shaileshlatey@gmail.com 9175631100 |
| Actual Dealer | SUSS MicroTec M/s Suss MicroTec, Germany, http://www.suss.com/en.html |
| SOP | SOP/91_SOP.pdf |
| Training & other policy documents | POLICY/91_Policy.pdf |
| Recipies | RECEPIES/91_RECEPIES.pdf |
| Glimpse | GLIMPSE/91_Glimpse.pdf |
| Tool Facilities Requirements | Nitrogen gas |
| Access | Open |
| Lab Phone No | 4493 |
| Substrate allowed | Si, GaN |
| Substrate Dimension | 2 inch max |
| Chemical allowed | photoresists, sio2, Si |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | N2 gas |
| Contamination remarks |