ICPRIE (New)
| Name of the Equipment | ICPRIE (New) |
| Category | clean |
| Operator | |
| System Owner | Bhanu B Upadhyay [NH] bhanu.upadhyay@iitb.ac.in |
| Short Name | |
| Make/ Model | Sentech/ SI 500 |
| Critical Tool | Yes |
| Serial Number | |
| FootPrint | ( Length 1.70 mtr, Breadth 1.75 mtr, Height1.67mt |
| InstallationDate | 11/01/2011 |
| Equipment Type | Dry Etch tools |
| Location | Nanoelectronics Processing Lab (NanoE bldg, 1st floor) |
| AMC | Required |
| Local Dealer | Om Scientific Pvt, Pune Om Scientific, A-2, Runwal Paradise, Bhusari Colony KOTHRUD, PUNE, MAHARASTRA INDIaN Ph: +919175631100 email: shaileshlatey@gmail.com Contact Person: Shailesh Latey Sr. Technical support Engineer Omscientific pvt LTD |
| Actual Dealer | Sentech, Germany Roland K�gel, Schwarzschildstra�e 2 12489 Berlin, Germany |
| SOP | SOP/98_SOP.pdf |
| Training & other policy documents | |
| Recipies | |
| Glimpse | |
| Tool Facilities Requirements | BCl3, Cl2, PN2, SF6, O2 , Ar and water supply |
| Access | Controlled |
| Lab Phone No | 4488 Ext Flash 107 OR 111 |
| Substrate allowed | GaAs/ GaN |
| Substrate Dimension | Pieces to 4 inch wafer |
| Chemical allowed | NA, GaAs/ GaN |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | BCl3, Cl2, Ar, O2, SF6 |
| Contamination remarks | No metal allowed |