Wet Chemistry Tools


Wet chemistry processes are an important part of semiconductor device fabrication. Use of chemical solutions is often needed at a various stages of device production; most commonly during substrate clean and wet etching. For silicon (Si) based devices, many of the wet chemical processes are already well-defined (i.e. required solution concentration, etch rate, etc.) in technical literature. However, when working with new materials, development of wet chemical processes that are controllable and selective in their action is a critical part of device fabrication and research.

IITBNF provides a safe and well-equipped environment to develop and carry out all wet chemical processes necessary for device fabrication. In order to minimize cross-contamination and maintain process control, we have dedicated wet benches and clean stations for silicon placed away from general purpose stations. Complementary apparatus such as sonicators, spin coaters and hot plates are also provided at specific stations.

The following table lists the key wet chemistry equipment within IITBNF:

# Instrument Location Contamination category
1 2 inch RCA Clean Station Wet Chemistry lab clean (for si)
2 TMAH wet etch station Wet Chemistry lab gold contaminated
3 General Purpose Wet Bench (Wet Chemistry Lab) Wet Chemistry lab gold contaminated
4 4 inch RCA Clean Station Wet Chemistry lab clean (for si)
5 General Purpose Wet Bench (EC Lab) EC Lab gold contaminated
6 Piranha Cleaning Wet Chemistry lab clean (for si)
7 NMPF Wetbench_2 inch RCA Piranha NMPF Lab clean
8 Wet bench_Metal etching NMPF Lab gold contaminated
9 Wet bench_Solvents NMPF Lab gold contaminated
10 Schlenk Line (1)_Fume Hood 1 7.1 Lab gold contaminated
11 4-arm glove box_7.1 lab 7.1 Lab gold contaminated
12 2-arm Glove Box 2D Materials and Devices Lab gold contaminated
13 Nano Wet Bench Nano Lab clean
14 1.2 Lab wet bench Nanoelectronics Processing Lab (NanoE bldg, 1st floor) clean
To understand what the contamination categories mean, click here
To check if your process plan complies with contamination rules, click here
To view current working status of all the instruments, click here
Last updated on: 20-Jul-2022