Double Sided Aligner (DSA)
| Name of the Equipment | Double Sided Aligner (DSA) |
| Category | litho/analytical |
| Operator | Hemant Kshirsagar Pankajkumar Gound Sheetal Yadav |
| System Owner | Hemant Kshirsagar hemant@ee.iitb.ac.in Pankajkumar Gound p15129@iitb.ac.in |
| Short Name | |
| Make/ Model | EVG/ EVG620 |
| Critical Tool | No |
| Serial Number | S070098 |
| FootPrint | Length 1.37 mtr, Breadth 2.23 mtr, Height 1.52 |
| InstallationDate | 11/03/2012 |
| Equipment Type | Lithography tools |
| Location | Nano Litho Lab |
| AMC | Available |
| Local Dealer | Mr. Amaresh Gaoundi(Tesscorn Nanoscience Inc.) TESSCORN NANO SCIENCE INC. 1285, 5th Main, 17th Cross HSR Sector 7 Bangalore 560068, India t:+91 80 2572 9425 f:+91 80 2572 9703 info@tesscorn-nanoscience.com E-mail:purusho@tesscorn-nanoscience.com Service Eng: amaresh@tesscorn.com |
| Actual Dealer | M/s E.V. Group M/s E.V. Group, E. Thallner GmbH, DI Erich Thallner StraBe 1A-4780 Scharding, Austria Email: Sales@EVGroup.com Phone: 43 7712 5311 0 parts&services@EVGroup.com |
| Training & other policy documents | POLICY/1_POLICY.pdf |
| Recipe List | RECEPIES/1_RECEPIES.pdf |
| Glimpse | GLIMPSE/1_GLIMPSE.pdf |
| Tool Facilities Requirements | Nitrogen, oil for oil pump |
| Access | Open |
| Lab Phone No | Optical Lithography |
| Substrate allowed | Si, Ge, GaAs, GaN |
| Substrate Dimension | 4 inch, 2 inch and small samples |
| Chemical allowed | NA, All that are allowed in the Nanolab |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | NA |
| Contamination remarks | NA |