Molecular Beam Epitaxy III-V
| Name of the Equipment | Molecular Beam Epitaxy III-V |
| Category | clean (III,V compounds) |
| Operator | |
| System Owner | |
| Short Name | |
| Make/ Model | Riber France/ EPINEAT |
| Critical Tool | No |
| Serial Number | NA |
| FootPrint | NA |
| InstallationDate | 05/09/2011 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | MBE Clean Room 1 (NanoE bldg, Gr floor) |
| AMC | Required |
| Local Dealer | NA NA |
| Actual Dealer | Riber France NA |
| Training & other policy documents | |
| Recipe List | |
| Glimpse | GLIMPSE/120_Glimpse.pdf |
| Tool Facilities Requirements | NA |
| Access | Controlled |
| Lab Phone No | |
| Substrate allowed | GaAs |
| Substrate Dimension | 2 inch minimum, 4 inch maximum |
| Chemical allowed | IPA, Methanol, Ga, In, Al, As, Si |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | PN2, He |
| Contamination remarks | NA |