| Name of the Equipment | Spinner 2 inch (General Purpose) |
| Category | litho/analytical |
| Operator | Hemant Kshirsagar
Pankajkumar Gound
Gopika Suresh
|
| System Owner | Pankajkumar Gound
p15129@iitb.ac.in
Hemant Kshirsagar
hemant@ee.iitb.ac.in
|
| Short Name | |
| Make/ Model | NA/ WS-4008-6NPP/ LIT |
| Critical Tool | No |
| Serial Number | 07104 |
| FootPrint | 11 |
| InstallationDate | |
| Equipment Type | Lithography tools |
| Location | Nanoelectronics Processing Lab (NanoE bldg, 1st floor) |
| AMC | Not Required |
| Local Dealer | M/s Simco Global Technology & Systems Ltd
M/s Simco Global Technology & Systems Ltd.
304, Thacker Tower,
Sector-17, Vashi,
Navi Mumbai 400 705 |
| Actual Dealer | M/s Laurell Techonologies Corporation, 441, Indust
sales@laurel.com |
| Training & other policy documents | |
| Recipe List | |
| Glimpse | |
| Tool Facilities Requirements | N2 gas |
| Access | Open |
| Lab Phone No | |
| Substrate allowed | Glass, Si, Quartz, GaN, G aAs |
| Substrate Dimension | minimum quarter of a 2 inch wafer; maximum a 2 inch wafer |
| Chemical allowed | Acetone for cleaning, PPR, SU8, CBlack, SO
D(B and
P), HMDS, P3HT, PVD
F, PDMS |
Precursors/ Targets allowed
*Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | NA |
| Contamination remarks | clean wafers |
