Karl Suss MJB4 Mask Aligner
| Name of the Equipment | Karl Suss MJB4 Mask Aligner |
| Category | litho/analytical |
| Operator | Hemant Kshirsagar Pankajkumar Gound Sheetal Yadav |
| System Owner | Gopika Suresh 30005372@iitb.ac.in Hemant Kshirsagar hemant@ee.iitb.ac.in |
| Short Name | NA |
| Make/ Model | Suss Microtec/ MJB4 |
| Critical Tool | Yes |
| Serial Number | 06130848 |
| FootPrint | 603mm*769mm*658mm |
| InstallationDate | 10/15/2013 |
| Equipment Type | Lithography tools |
| Location | Nanoelectronics Processing Lab (NanoE bldg, 1st floor) |
| AMC | Required |
| Local Dealer | OM Scientific M/s Om Scientific,Pune Contact person :-Anand Vairagar/Shaliesh Latey(shaileshlatey@gmail.com) 917563100/9867770801 |
| Actual Dealer | Suss Microtec Suss Microtec M/s Suss MicroTec , Germany http://www.suss.com/en.html |
| Training & other policy documents | POLICY/190_POLICY.pdf |
| Recipe List | |
| Glimpse | GLIMPSE/190_GLIMPSE.pdf |
| Tool Facilities Requirements | NItrogen gas and CDA |
| Access | Open |
| Lab Phone No | Optical Lithography |
| Substrate allowed | Si,GaN, GaAs, Ge |
| Substrate Dimension | upto 4 inch |
| Chemical allowed | only photo resist, sio2,si |
| Precursors/ Targets allowed *Based on stock availability | N/A |
| Precursor/ Target loaded inside tool | |
| Target dimension | N/A |
| Gases allowed | Nitrogen |
| Contamination remarks | Samples must be free of backside contamination. Mask should be checked after each working session. Clean with acetone / IPA or with soft tissue to remove any solid or liquid residues. |