Equipment Details


Sputter Orion

Name of the EquipmentSputter Orion
Categorygold contaminated
OperatorMinita Surwade
Shahiroze Khetani
Gopika Suresh
System OwnerAkula Rao
30007057@iitb.ac.in

Akanksha Chouhan
174070019@iitb.ac.in

Short Name
Make/ ModelAJA international, Inc/ Orion Sputter PHASE
Critical ToolNo
Serial NumberDIT/11/EQP/012/12/00
FootPrint(l) 2318 mm x (b) 762 mm x (h) 2160mm
InstallationDate01/25/2014
Equipment TypeDeposition, Growth and Annealing systems
LocationNano Lab
AMC Required
Local Dealer

Mr. Varadaraj, Service Executive Engineer Anarghya Innovations and Technology Pvt Ltd, Bengaluru. Ph: +91 80 23376488 M : +91-9743446512 www.anarghyainnotech.com
Actual DealerAJA

Mr. Joe Cronin, Customer Service Engineer AJA International, INC 809 Country Way Scituate, MA 02066 781-545-7365 E-mail: topgun@ajaint.com Web: www.ajaint.com
Training & other policy documentsPOLICY/197_POLICY.pdf
Recipe List RECEPIES/197_RECEPIES.pdf
Glimpse GLIMPSE/197_GLIMPSE.pdf
Tool Facilities Requirementschiller, process gases
AccessControlled
Lab Phone NoDeposition: PVD Sputter Tools
Substrate allowedSi, Ge, GaN,GaAs,LSMO,PCMO,YIG,SRO, (No Glass),Lithium Niobate
Substrate DimensionSample height not more than 3 mm
Chemical allowedIPA, Photoresist, ebeam resist, Nb, NbN, Yb, Sn, Ge, Pt, Au, Gd, IrMn, Cr, YIG, Fe, Ni, Ta, Cu, Ru, Cr, MgO, Al2O3, SnGe alloy, Ti, CoFeB, SiO2, Al, Co, W, Ag, NiFe
Precursors/ Targets allowed
*Based on stock availability
Yb, Sn, Ge, Pt, Gd, IrMn, Cr,Fe, Ni, Ta, Cu, Ru, Cr, MgO, Al2O3, SnGe alloy, Ti, CoFeB, SiO2, Al, Co, W, Ag, NiFe
Precursor/ Target loaded inside tool
Target dimension2 inch diameter, 0.250 inch thickness
Gases allowedAr, N2, CDA
Contamination remarksIf someone wants to introduce new material/target, he/she needs to get permission for that.Na+ and K+ are not allowed. For outside/ NCPRE/ Org electronics lab samples, contact SO/ Process engineer.
Last updated on: 24-Oct-2026