HRXRD
| Name of the Equipment | HRXRD |
| Category | in line ac |
| Operator | Gopika Suresh Akula Rao Karuna Nyaupane |
| System Owner | Pankajkumar Gound p15129@iitb.ac.in Gopika Suresh 30005372@iitb.ac.in |
| Short Name | |
| Make/ Model | Rigaku/ Smartlab 3KW |
| Critical Tool | No |
| Serial Number | JD3822N |
| FootPrint | Width =~1200 mm Depth =~900 mm Height =~1820 |
| InstallationDate | 10/08/2013 |
| Equipment Type | Material and structural characterization tools |
| Location | MBE Clean Room 2 (NanoE bldg, Gr floor) |
| AMC | Required |
| Local Dealer | I R Technology Services Pvt Ltd M/s. I.R. Technology Services Pvt. Ltd. EL-91, TTC Industrial Area, MIDC, Mahape, Navi Mumbai - 400 710 Tel: 022-6789 6600/18/06 Fax:022-2768 1253 Email: sales_newbom@irtech.in |
| Actual Dealer | Rigaku M/s. Rigaku Corporation, International Marketing Division, 3-9-12 Matsubara-Cho, Akishima-Shi, Tokyo - 196-8666 Japan |
| Training & other policy documents | POLICY/198_POLICY.pdf |
| Recipe List | RECEPIES/198_RECEPIES.pdf |
| Glimpse | GLIMPSE/198_GLIMPSE.pdf |
| Tool Facilities Requirements | Chiller |
| Access | Controlled |
| Lab Phone No | Analytical |
| Substrate allowed | Si, Ge, Glass, Sapphire, GaAs, GaN, STO |
| Substrate Dimension | Min - 1cmx1cm, Max- 4 inch wafer |
| Chemical allowed | IPA To clean chuck, Only thin films |
| Precursors/ Targets allowed *Based on stock availability | N.A |
| Precursor/ Target loaded inside tool | |
| Target dimension | N.A |
| Gases allowed | N.A |
| Contamination remarks | SUBSTRATE SHOULD NOT BE REACTING WITH AL CHUCK |