ALD (Non LL)
| Name of the Equipment | ALD (Non LL) |
| Category | semi clean b |
| Operator | Anjum Khan Sheetal Yadav |
| System Owner | Prabhat Prajapati (H) 194073002@iitb.ac.in Anjum Khan anjum04@iitb.ac.in |
| Short Name | NA |
| Make/ Model | Cambridge Nanotechnology Ultratech SE Asia Pte. Lt |
| Critical Tool | No |
| Serial Number | NA |
| FootPrint | 1.01 mtrs X 0.56 mtrs |
| InstallationDate | 01/20/2014 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Nano Lab |
| AMC | Required |
| Local Dealer | Sujata Singh sujata@dynotech.in 09560766116 Dynotech Instruments Pvt. Ltd. 803-804, Vishwa Sadan, District Centre, Janak Puri, New Delhi- 100 058 Ph: 91-11-2561 2270 Email: sales@dynotech.in Contact Person: Sujata Singh sujata@dynotech.in |
| Actual Dealer | Ultratech SE Asia Pte. Ltd. Ultratech SE Asia Pte. Ltd. Company Registration No. 20102976Z No. 02-01, 1 Kaki Bukit View, Techview, Singapore 415941 |
| Training & other policy documents | POLICY/199_POLICY.pdf |
| Recipe List | RECEPIES/199_RECEPIES.pdf |
| Glimpse | GLIMPSE/199_GLIMPSE.pdf |
| Tool Facilities Requirements | Chiller water, PN2, GN2, O2, Ar, NH3 |
| Access | Open |
| Lab Phone No | Deposition: CVD Tools |
| Substrate allowed | Silicon, Germanium, III-V substrates,SiC,SiGe |
| Substrate Dimension | 1cm X 1cm upto 6 inch |
| Chemical allowed | Tetrakis(dimethylamido)hafnium(IV), Tetrakis(dimethylamido)zirconium(IV), Tetrakis(DIMETHYLAMIDO)Titanium(IV), Trimethyl aluminium, Diethyl zinc, Tetrakis(dimethylamino)silane, Diethylamine, Nickel, Molybdenum, HF-pyridine, NA |
| Precursors/ Targets allowed *Based on stock availability | Al, Ti, Hf, Zr, Zn, Si, Mo |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | Nitrogen, Oxygen, Argon, Ammonia |
| Contamination remarks | Samples from gold contaminated tools when processed without a separate carrier wafer and having photoresist not allowed. Samples with Na and K not allowed |