ICPRIE GaN Old
| Name of the Equipment | ICPRIE GaN Old |
| Category | clean |
| Operator | |
| System Owner | Aaqib Sheikh 23d0540@iitb.ac.in |
| Short Name | |
| Make/ Model | Sentech/ SI 500 |
| Critical Tool | Yes |
| Serial Number | NA |
| FootPrint | ( Length 1.70 mtr, Breadth 1.75 mtr, Height1.67mt |
| InstallationDate | 2008 |
| Equipment Type | Dry Etch tools |
| Location | Nanoelectronics Processing Lab (NanoE bldg, 1st floor) |
| AMC | Required |
| Local Dealer | Om Scientific Pvt, Pune Om Scientific, A-2, Runwal Paradise, Bhusari Colony KOTHRUD, PUNE, MAHARASTRA INDIaN Ph: +919175631100 email: shaileshlatey@gmail.com Contact Person: Shailesh Latey Sr. Technical support Engineer Omscientific pvt LTD |
| Actual Dealer | Sentech, Germany Roland K�gel, Schwarzschildstra�e 2 12489 Berlin, Germany |
| Training & other policy documents | POLICY/21_POLICY.pdf |
| Recipe List | |
| Glimpse | GLIMPSE/21_Glimpse.pdf |
| Tool Facilities Requirements | BCl3, Cl2, PN2, SF6, O2 , Ar and water supply |
| Access | Controlled |
| Lab Phone No | |
| Substrate allowed | GaAs/ GaN |
| Substrate Dimension | Pieces to 4 inch wafer |
| Chemical allowed | NA, GaAs/ GaN |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | BCl3, Cl2 , Ar, O2 |
| Contamination remarks | metals not allowed |