Multi-pocket Electron-beam Evaporator (4 target - GaN)
| Name of the Equipment | Multi-pocket Electron-beam Evaporator (4 target - GaN) |
| Category | gold contaminated |
| Operator | |
| System Owner | Dipanwita Aich 22d0539@iitb.ac.in |
| Short Name | |
| Make/ Model | / |
| Critical Tool | Yes |
| Serial Number | |
| FootPrint | |
| InstallationDate | 04/26/2014 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Nanoelectronics Processing Lab (NanoE bldg, 1st floor) |
| AMC | Required |
| Local Dealer | Oerlikon Leybold Vacuum India Pvt. Ltd. sandeep.chaudhari@oerlikon.com |
| Actual Dealer | Sandep chaudhri NA |
| Training & other policy documents | POLICY/212_POLICY.pdf |
| Recipe List | |
| Glimpse | GLIMPSE/212_GLIMPSE.pdf |
| Tool Facilities Requirements | Water Chiller |
| Access | Controlled |
| Lab Phone No | |
| Substrate allowed | Only semiconducting substrates are allowed. No glass. |
| Substrate Dimension | Approx 4 Inch or less |
| Chemical allowed | IPA for cleaning, Ti/ Al/ Ni/ Au |
| Precursors/ Targets allowed *Based on stock availability | Ti/ Al/ Ni/ Au |
| Precursor/ Target loaded inside tool | |
| Target dimension | Slugs |
| Gases allowed | PN2 for venting |
| Contamination remarks | Top surface is either PR coated or stable element and Only clean room processed wafers are allowed. The wafer should not have goneout of the clean room at any time.wafers processed in clean tools are only allowed |