| Name of the Equipment | Molecular Beam Epitaxy Si Ge Sn |
| Category | clean |
| Operator | |
| System Owner | Dhammapriy Gayakwad
204366004@iitb.ac.in
|
| Short Name | |
| Make/ Model | RIBER/ Compact 12 |
| Critical Tool | No |
| Serial Number | SYS 14500 |
| FootPrint | 3.5 x 2 x 3 m |
| InstallationDate | 01/31/2014 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | MBE Clean Room 1 (NanoE bldg, Gr floor) |
| AMC | Required |
| Local Dealer | NA
NA |
| Actual Dealer | RIBER
customerservice@riber.fr
Tel: +33 (1) 39 96 65 28
Tel: +33 (1) 39 96 66 00 |
| Training & other policy documents | |
| Recipe List | |
| Glimpse | |
| Tool Facilities Requirements | PN2- 99.999%, Compressed Air, Water Chiller, Liquid N2 |
| Access | Controlled |
| Lab Phone No | |
| Substrate allowed | Si, Ge, Sn |
| Substrate Dimension | Quarter of 2 inch wafer (Fixed) |
| Chemical allowed | NA, Si, Ge, Sn (Are available for Process) |
Precursors/ Targets allowed
*Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | NA |
| Contamination remarks | No earlier processed Samples allowed. Only cleaned Si and Ge wafers |
