| Name of the Equipment | Nano Wet Bench |
| Category | clean |
| Operator | |
| System Owner | Deepti Rukade
rdeepti@iitb.ac.in
|
| Short Name | |
| Make/ Model | Nano clean Contamination Control Solutions/ Nil |
| Critical Tool | Yes |
| Serial Number | Nil |
| FootPrint | Width: 154 cm breadth: 80 cm Height: 213 cm |
| InstallationDate | 03/04/2016 |
| Equipment Type | Wet chemistry tools |
| Location | Nano Lab |
| AMC | Not Required |
| Local Dealer | Nano Clean Contamination Control Solutions
Nano Clean Contamination Control Solutions
#126, 1st floor, 1st Block, BEL Layout
Vidyaranyapura, Bangalore -560 097
India
Mr Madhu: 09620922888 |
| Actual Dealer | Nano Clean Contamination Control Solutions
Nano Clean Contamination Control Solutions
#126, 1st floor, 1st Block, BEL Layout
Vidyaranyapura, Bangalore -560 097
India
Mr Madhu: 09620922888
madhu@nanoclean.co.uk |
| Training & other policy documents | |
| Recipe List | |
| Glimpse | |
| Tool Facilities Requirements | Nitrogen,DI Water |
| Access | Open |
| Lab Phone No | |
| Substrate allowed | Silicon,quartz,Ge |
| Substrate Dimension | max 4 |
| Chemical allowed | Acetone,IPA,HF, |
Precursors/ Targets allowed
*Based on stock availability | na |
| Precursor/ Target loaded inside tool | |
| Target dimension | na |
| Gases allowed | Nitrogen for drying |
| Contamination remarks | Only cleaning of wafers allowed. Lift off and wet etching not allowed. |
