| Name of the Equipment | 1.2 Lab wet bench |
| Category | clean |
| Operator | |
| System Owner | |
| Short Name | |
| Make/ Model | Laxmi Instruments/Nil |
| Critical Tool | No |
| Serial Number | Nil |
| FootPrint | |
| InstallationDate | 2013 |
| Equipment Type | Wet chemistry tools |
| Location | Nanoelectronics Processing Lab (NanoE bldg, 1st floor) |
| AMC | Required |
| Local Dealer | Laxmi Instruments
kailas@laxmiinstruments.com |
| Actual Dealer |
kailas@laxmiinstruments.com |
| Training & other policy documents | |
| Recipe List | |
| Glimpse | |
| Tool Facilities Requirements | Nitrogen,DI Water |
| Access | Open |
| Lab Phone No | |
| Substrate allowed | Silicon,quartz,Ge,GaN |
| Substrate Dimension | max 4 |
| Chemical allowed | Acetone,IPA,Hf, IPA,Acetone,BHF,2%HF and HCL |
Precursors/ Targets allowed
*Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | Nitrogen for drying |
| Contamination remarks | Only cleaning of wafers allowed Lift off not allowed |
