Double Side Mask Aligner MJB6
| Name of the Equipment | Double Side Mask Aligner MJB6 |
| Category | litho/analytical |
| Operator | Hemant Kshirsagar Pankajkumar Gound Pradosh Sahoo |
| System Owner | Pankajkumar Gound p15129@iitb.ac.in Hemant Kshirsagar hemant@ee.iitb.ac.in |
| Short Name | |
| Make/ Model | SUSS MicroTec |
| Critical Tool | No |
| Serial Number | MA6BA6-001429 |
| FootPrint | Length 1.5 mtr, Breadth 2.5 mtr, Height 2 |
| InstallationDate | |
| Equipment Type | Lithography tools |
| Location | Nanoelectronics Processing Lab (NanoE bldg, 1st floor) |
| AMC | Required |
| Local Dealer | Chintan Patel M/s Omscientific Private Limited Unit No. 7, Datta Thakur Society Right Bhusari Colony, Behind Lohia Jain IT Park, Paud Road, Kothrud, Pune-411038 Ph. No.: +91-9970513862 Email : info@omscientific.com |
| Actual Dealer | Karl SUSS SUSS MicroTec Lithography GmbH Schleissheimer Str. 90 D-85748 Garching bei Munchen Germany Email : sooppipatt@suss.com |
| Training & other policy documents | POLICY/328_POLICY.pdf |
| Recipe List | RECEPIES/328_RECEPIES.pdf |
| Glimpse | GLIMPSE/328_GLIMPSE.pdf |
| Tool Facilities Requirements | CDA, Electricity, N2, Pump |
| Access | Open |
| Lab Phone No | Optical Lithography |
| Substrate allowed | Si, Ge, GaAs, GaN |
| Substrate Dimension | 4 inch, 2 inch and small samples |
| Chemical allowed | IPA for cleaning, All photoresist |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | 63 |
| Target dimension | NA |
| Gases allowed | PN2, GN2 |
| Contamination remarks | NA |